ASTM F1845-2008 用高质量减少辉光放电质谱仪测量电子级铝铜、铝硅和铝铜硅中微量金属杂质的标准试验方法
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【英文标准名称】:StandardTestMethodforTraceMetallicImpuritiesinElectronicGradeAluminum-Copper,Aluminum-Silicon,andAluminum-Copper-SiliconAlloysbyHigh-Mass-ResolutionGlowDischargeMassSpectrometer
【原文标准名称】:用高质量减少辉光放电质谱仪测量电子级铝铜、铝硅和铝铜硅中微量金属杂质的标准试验方法
【标准号】:ASTMF1845-2008
【标准状态】:现行
【国别】:美国
【发布日期】:2008
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:F01.17
【标准类型】:(TestMethod)
【标准水平】:()
【中文主题词】:
【英文主题词】:aluminum;aluminum-copperalloys;aluminum-copper-siliconalloys;aluminum-siliconalloys;electronics;glowdischargemassspectrometer(GDMS);purityanalysis;sputteringtarget;tracemetallicimpurities;Impurities--electronicmaterials/applications;
【摘要】:Thistestmethodisintendedforapplicationinthesemiconductorindustryforevaluatingthepurityofmaterials(forexample,sputteringtargets,evaporationsources)usedinthinfilmmetallizationprocesses.Thistestmethodmaybeusefulinadditionalapplications,notenvisionedbytheresponsibletechnicalcommittee,asagreeduponbetweenthepartiesconcerned.ThistestmethodisintendedforusebyGDMSanalystsinvariouslaboratoriesforunifyingtheprotocolandparametersfordeterminingtraceimpuritiesinaluminum-copper,aluminum-silicon,andaluminum-copper-siliconalloys.Theobjectiveistoimprovelaboratory-to-laboratoryagreementofanalysisdata.ThistestmethodisalsodirectedtotheusersofGDMSanalysesasanaidtounderstandingthedeterminationmethod,andthesignificanceandreliabilityofreportedGDMSdata.Formostmetallicspeciesthedetectionlimitforroutineanalysisisontheorderof0.01wt.ppm.Withspecialprecautions,detectionlimitstosub-ppblevelsarepossible.Thistestmethodmaybeusedasarefereemethodforproducersandusersofelectronic-gradealuminum-copper,aluminum-siliconandaluminum-copper-siliconmaterials.1.1Thistestmethoddeterminestheconcentrationsoftracemetallicimpuritiesinhighpurity(99.99wt.%pure,orpurer,withrespecttometallictraceimpurities)aluminum-copper,aluminum-siliconandaluminum-copper-siliconalloyswithmajoralloyconstituentsasfollows:
aluminum
Greaterthan95.0%
copper
Lessorequalthan5.0%
silicon
Lessorequalthan5.0%
【原文标准名称】:用高质量减少辉光放电质谱仪测量电子级铝铜、铝硅和铝铜硅中微量金属杂质的标准试验方法
【标准号】:ASTMF1845-2008
【标准状态】:现行
【国别】:美国
【发布日期】:2008
【实施或试行日期】:
【发布单位】:美国材料与试验协会(US-ASTM)
【起草单位】:F01.17
【标准类型】:(TestMethod)
【标准水平】:()
【中文主题词】:
【英文主题词】:aluminum;aluminum-copperalloys;aluminum-copper-siliconalloys;aluminum-siliconalloys;electronics;glowdischargemassspectrometer(GDMS);purityanalysis;sputteringtarget;tracemetallicimpurities;Impurities--electronicmaterials/applications;
【摘要】:Thistestmethodisintendedforapplicationinthesemiconductorindustryforevaluatingthepurityofmaterials(forexample,sputteringtargets,evaporationsources)usedinthinfilmmetallizationprocesses.Thistestmethodmaybeusefulinadditionalapplications,notenvisionedbytheresponsibletechnicalcommittee,asagreeduponbetweenthepartiesconcerned.ThistestmethodisintendedforusebyGDMSanalystsinvariouslaboratoriesforunifyingtheprotocolandparametersfordeterminingtraceimpuritiesinaluminum-copper,aluminum-silicon,andaluminum-copper-siliconalloys.Theobjectiveistoimprovelaboratory-to-laboratoryagreementofanalysisdata.ThistestmethodisalsodirectedtotheusersofGDMSanalysesasanaidtounderstandingthedeterminationmethod,andthesignificanceandreliabilityofreportedGDMSdata.Formostmetallicspeciesthedetectionlimitforroutineanalysisisontheorderof0.01wt.ppm.Withspecialprecautions,detectionlimitstosub-ppblevelsarepossible.Thistestmethodmaybeusedasarefereemethodforproducersandusersofelectronic-gradealuminum-copper,aluminum-siliconandaluminum-copper-siliconmaterials.1.1Thistestmethoddeterminestheconcentrationsoftracemetallicimpuritiesinhighpurity(99.99wt.%pure,orpurer,withrespecttometallictraceimpurities)aluminum-copper,aluminum-siliconandaluminum-copper-siliconalloyswithmajoralloyconstituentsasfollows:
aluminum
Greaterthan95.0%
copper
Lessorequalthan5.0%
silicon
Lessorequalthan5.0%
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